@article {58926, title = {Asymmetric particle fluxes from drifting ionization zones in sputtering magnetrons}, journal = {Plasma Sources Science and Technology}, volume = {23}, year = {2014}, month = {04/2014}, pages = {025007}, abstract = {

Electron and ion fluxes from direct current and high-power impulse magnetron sputtering (dcMS and HiPIMS) plasmas were measured in the plane of the target surface. Biased collector probes and a particle energy and mass analyzer showed asymmetric emission of electrons and of singly and doubly charged ions. For both HiPIMS and dcMS discharges, higher fluxes of all types of particles were observed in the direction of the electrons{\textquoteright} E x B drift. These results are put in the context with ionization zones that drift over the magnetron{\textquoteright}s racetrack. The measured currents of time-resolving collector probes suggest that a large fraction of the ion flux originates from drifting ionization zones, while energy-resolving mass spectrometry indicates that a large fraction of the ion energy is due to acceleration by an electric field. This supports the recently proposed hypothesis that each ionization zone is associated with a negative{\textendash}positive{\textendash}negative space charge structure, thereby producing an electric field that accelerates ions from the location where they were formed.

}, keywords = {Instrumentation and measurement, Plasma physics, Surfaces, interfaces and thin films}, issn = {0963-0252}, doi = {10.1088/0963-0252/23/2/025007}, author = {Matjaž Panjan and Robert Franz and Andr{\'e} Anders} } @article {2974, title = {Achieving high mobility ZnO:Al at very high growth rates by dc filtered cathodic arc deposition}, journal = {Journal of Physics D: Applied Physics}, volume = {44}, year = {2011}, pages = {232003-232007}, chapter = {232003}, abstract = {

Achieving a high growth rate is paramount for making large-area transparent conducting oxide coatings at a low cost. Unfortunately, the quality of thin films grown by most techniques degrades as the growth rate increases. Filtered dc cathodic arc is a lesser known technique which produces a stream of highly ionized plasma, in stark contrast to the neutral atoms produced by standard sputter sources. Ions bring a large amount of potential energy to the growing surface which is in the form of heat, not momentum. By minimizing the distance from cathode to substrate, the high ion flux gives a very high effective growth temperature near the film surface without causing damage from bombardment. The high surface temperature is a direct consequence of the high growth rate and allows for high-quality crystal growth. Using this technique, 500{\textendash}1300\ nm thick and highly transparent ZnO\ :\ Al films were grown on glass at rates exceeding 250\ nm\ min-1 while maintaining resistivity below 5 {\texttimes} 10-4\ Ω\ cm with electron mobility as high as 60\ cm2\ V-1\ s-1.

}, doi = {10.1088/0022-3727/44/23/232003}, author = {Rueben J. Mendelsberg and Sunnie H.N. Lim and Yuankun Zhu and Joe Wallig and Delia J. Milliron and Andr{\'e} Anders} }