@article {58927,
	title = {Spectroscopic imaging of self-organization in high power impulse magnetron sputtering plasmas},
	journal = {Applied Physics Letters},
	volume = {103},
	year = {2013},
	month = {07/2013},
	pages = {054104},
	abstract = {<p>Excitation and ionization conditions in traveling ionization zones of high power impulse magnetron sputtering plasmas were investigated using fast camera imaging through interference filters. The images, taken in end-on and side-on views using light of selected gas and target atom and ion spectral lines, suggest that ionization zones are regions of enhanced densities of electrons, and excited atoms and ions. Excited atoms and ions of the target material (Al) are strongly concentrated near the target surface. Images from the highest excitation energies exhibit the most localized regions, suggesting localized Ohmic heating consistent with double layer formation.</p>},
	keywords = {Aluminium, ionization, Ionizing radiation, plasma ionization, visible spectra},
	issn = {00036951},
	doi = {10.1063/1.4817257},
	author = {Joakim Andersson and Pavel A Ni and Andr{\'e} Anders}
}
@article {12244,
	title = {Self-sputtering far above the runaway threshold: an extraordinary metal ion generator},
	journal = {Physical Review Letters},
	year = {2008},
	abstract = {<p>When self-sputtering is driven far above the runaway threshold voltage, energetic electrons are made available to produce excess plasma far from the magnetron target. Ionization balance considerations show that the secondary electrons deliver the necessary energy to the remote zone. Thereby, such a system can be an extraordinarily prolific generator of useable metal ions. Contrary to other known sources, the ion current to a substrate can exceed the discharge current. For gasless self-sputtering of copper, the useable ion current scales exponentially with the discharge voltage.</p>},
	author = {Joakim Andersson and Andr{\'e} Anders}
}
