01143nas a2200157 4500008004100000050001500041245005700056210005700113260002900170300001400199490000700213520065000220100002700870700002300897856006500920 2000 eng d aLBNL-4661200aLiquid Phase Deposition of Electrochromic Thin Films0 aLiquid Phase Deposition of Electrochromic Thin Films aUppsala, Swedenc08/2000 a2119-21230 v463 a
Thin films of titanium, zirconium and nickel oxides were deposited on conductive SnO2:F glass substrates by immersion in aqueous solutions. The films are transparent, conformal, of uniform thickness and appearance, and adhere strongly to the substrates. On electrochemical cycling, TiO2, mixed TiO2-ZrO2, and NiOx films exhibited stable electrochromism with high coloration efficiencies. These nickel oxide films were particularly stable compared with films prepared by other non-vacuum techniques. The method is simple, inexpensive, energy efficient, and readily scalable to larger substrates.
1 aRichardson, Thomas, J.1 aRubin, Michael, D. uhttps://facades.lbl.gov/publications/liquid-phase-deposition