01696nas a2200193   4500008004100000245018300041210006900224260001200293300001100305490000700316520097400323100002301297700002601320700002201346700001901368700002101387700001801408856007601426       2008                        eng d00aThe structure and electron energy loss near edge structure of tungsten oxide thin films prepared by pulsed cathodic arc deposition and plasma-assisted pulsed magnetron sputtering0 astructure and electron energy loss near edge structure of tungst  c04/2008  a1752160 v203 a<p>The microstructure and energy-loss near-edge structure (ELNES) of pulsed cathodic arc and pulsed magnetron sputtered WO<sub>3</sub> thin films were investigated. It was found that the cathodic arc deposited material consisted of the α-WO<sub>3</sub> phase with a high degree of crystallinity. In contrast, the magnetron sputtered material was highly disordered making it difficult to determine its phase. A self-consistent real space multiple scattering approach was used to calculate the NES of the various phases of WO<sub>3</sub>. Each phase was found to exhibit a unique NES allowing different phases of WO<sub>3</sub> to be identified. The real space approach also allowed the origin of the main features in the NES to be investigated as the cluster size increased. The calculated NES for the room temperature γ-WO<sub>3</sub> was found to compare well to previous X-ray absorption spectra and to NES obtained by full-potential band structure calculation.</p>1 aField, Matthew, R.1 aMcCulloch, Dougal, G.1 aLim, Sunnie, H.N.1 aAnders, André1 aKeast, Vicki, J.1 aBurgess, R.W.  uhttps://facades.lbl.gov/publications/structure-and-electron-energy-loss