01644nas a2200205 4500008004100000245011300041210006900154260001200223300001400235490000800249520093200257653003001189653002701219653002401246653002301270653002501293100002301318700001901341856007801360 2007 eng d00aPhysical properties of erbium implanted tungsten oxide films deposited by reactive dual magnetron sputtering0 aPhysical properties of erbium implanted tungsten oxide films dep c05/2007 a5264-52690 v5153 a

Amorphous and partially crystalline WO3 thin films were prepared by reactive dual magnetron sputtering and successively implanted by erbium ions with a fluence in the range from 7.7 x 1014 to 5 x 1015 ions/cm2. The electrical and optical properties were studied as a function of the film deposition parameters and the ion fluence. Ion implantation caused a strong decrease of the resistivity, a moderate decrease of the index of refraction and a moderate increase of the extinction coefficient in the visible and near infrared, while the optical band gap remained almost unchanged. These effects could be largely ascribed to ion-induced oxygen deficiency. When annealed in air, the already low resistivities of the implanted samples decreased further up to 70°C, whereas oxidation, and hence a strong increase of the resistivity, was observed at higher annealing temperatures

10aDual magnetron sputtering10aelectrical resistivity10aEr ion implantation10aoptical properties10atungsten oxide films1 aMohamed, Sodky, H.1 aAnders, André uhttps://facades.lbl.gov/publications/physical-properties-erbium-implanted02166nas a2200193 4500008004100000245011300041210006900154300001400223490000800237520149200245653003001737653001501767653002301782653001501805653003501820100002301855700001901878856007501897 2006 eng d00aStructural, optical and electrical properties of WOxNy films deposited by reactive dual magnetron sputtering0 aStructural optical and electrical properties of WOxNy films depo a2977-29830 v2013 a

Thin films of tungsten oxynitrides were prepared by dual magnetron sputtering of tungsten using argon/oxygen/nitrogen gas mixtures with various nitrogen/oxygen ratios. The presence of even relatively small amounts of oxygen led to close-to-stoichiometric WO3, with little incorporation of nitrogen, therefore the films were labeled as WOx(Ny). Oxygen had a great effect not only on the composition but on the structure of WOx(Ny) films, as shown by Rutherford backscattering and X-ray diffraction, respectively. Significant incorporation of nitrogen occurred only when the nitrogen partial pressure exceeded 89% of the total reactive gas pressure. Sharp changes in the stoichiometry, deposition rate, room temperature resistivity, electrical activation energy and optical band gap were observed when the nitrogen/oxygen ratio was high. The deposition rate increased from 0.31 to 0.89 nm/s, the room temperature resistivity decreased from 1.65 × 108 to 1.82 × 10− 2 Ω cm, the electrical activation energy decreased from 0.97 to 0.067 eV, and the optical band gap decreased from 3.19 to 2.94 eV upon nitrogen incorporation into the films. WOx(Ny) films were highly transparent as long as the nitrogen incorporation was low, and were brownish (absorbing) and partially reflecting as nitrogen incorporation became significant.

10aDual magnetron sputtering10aelectrical10aoptical properties10astructural10atungsten oxynitride thin films1 aMohamed, Sodky, H.1 aAnders, André uhttps://facades.lbl.gov/publications/structural-optical-and-electrical03007nas a2200217 4500008004100000245013800041210006900179260001200248300001200260490000700272520227100279653003002550653002002580653001102600653002302611653002302634100001902657700002102676700002302697856006902720 1995 eng d00aOptical and Electrochemical Characteristics of Niobium Oxide Films Prepared by Sol-Gel Process and Magnetron Sputtering: A Comparison0 aOptical and Electrochemical Characteristics of Niobium Oxide Fil c08/1996 a285-2960 v403 a

Electrochromic niobia (Nb205) coatings were prepared by the sot-gel spin-coating and d.c. magnetron sputtering techniques. Parameters were investigated for the process fabrication of sol-gel spin coated Nb205 films exhibiting high coloration efficiency comparable with that d.c. magnetron sputtered niobia films. X-ray diffraction studies (XRD) showed that the sot-gel deposited and magnetron sputtered films heat treated at temperatures below 450°C, were amorphous, whereas those heat treated at higher temperatures were slightly crystalline. X-ray photoelectron spectroscopy (XPS) studies showed that the stoichiometry of the films was Nb205. The refractive index and electrochromic coloration were found to depend on the preparation technique. Both films showed low absorption and high transparency in the visible range. We found that the n, k values of the sot-gel deposited films to be lower than for the sputtered films. The n and k values were n = 1.82 and k = 3 × 10−3, and n = 2.28 and k = 4 × 10−3 at 530 urn for sot-gel deposited and sputtered films, respectively. The electrochemical behavior and structural changes were investigated in 1 M LiC104/propylene carbonate solution. Using the electrochemical measurements and X-ray photoelectron spectroscopy, the probable electrode reaction with the lithiation and delithiation is Nb2O5 + x Li+ + x e ↔ LixNb205. Cyclic voltametric (CV) measurements showed that both Nb205 films exhibits electrochemical reversibility beyond 1200 cycles without change in performance. “In situ” optical measurement revealed that those films exhibit an electrochromic effect in the spectral range 300 < λ < 2100 nm but remain unchanged in the infrared spectral range. The change in visible transmittance was 40% for 250 nm thick electrodes. Spectroelectrochemical measurements showed that spin coated films were essentially electrochemically equivalent to those prepared by d.c. magnetron sputter deposition.

10aD.C. magnetron sputtering10aelectrochromism10aNiobia10aoptical properties10asol-gel deposition1 aÖzer, Nilgün1 aLampert, Carl, M1 aRubin, Michael, D. uhttps://facades.lbl.gov/publications/optical-and-electrochemical02070nas a2200205 4500008004100000245010400041210006900145260002700214520133500241653003201576653002201608653003101630653002601661653002301687653002301710100001901733700002001752700002101772856007101793 1995 eng d00aOptical and Electrochemical Properties of Sol-gel Spin Coated CeO2-TiO2 Films0 aOptical and Electrochemical Properties of Solgel Spin Coated CeO aSan Diego, CAc07/19953 a

The optical and electrochemical properties of sol-gel spin coated Ce02-TiO2 (50% CeO2) films were investigated for electrochrornic applications. The coating solutions were prepared by using mixed organic-inorganic | Ti(OC2H5)4 and Ce(NH4)2 (NO3)6 | precursors. X-ray diffraction studies showed the sol-gel spin-coated films were composed of an amorphous matrix of titanium oxide containing nanocrystallites of cerium oxide. The coating solar transmission value was Ts=0.8 (250 nm thick). The refractive index and the extinction coefficient were derived from transmittance measurements in the UV-VIS-NIR regions. These films had refractive index value of n=2.18 and extinction coefficient value of k=8x10-4 at λ=550 nm. Cyclic voltametric measurements showed reversible electrochemical insertion of lithium ions in a CeO2-TiO2/LiClO4-propylene carbonate electrochemical cell. During cycling the films maintain high optical transmittance. Spectrophotometric and electrochemical investigations performed on CeO2-TiO2 films revealed that these films are suitable as an optically passive counter-electrode in lithium electrochromic devices.

10acerium oxide-titanium oxide10acounter electrode10aelectrochemical properties10aelectrochromic device10aoptical properties10asol-gel deposition1 aÖzer, Nilgün1 aDeSouza, Selmar1 aLampert, Carl, M uhttps://facades.lbl.gov/publications/optical-and-electrochemical-002295nas a2200217 4500008004100000050001500041245013600056210006900192260001200261300001200273490000800285520157600293653002101869653001801890653002301908653003701931100001901968700001801987700002102005856005102026 1995 eng d aLBNL-3900800aPreparation and Properties of Spin-Coated Nb2O5 Films by the Sol-Gel Process for Electrochemical Applications0 aPreparation and Properties of SpinCoated Nbsub2subOsub5sub Films c05/1996 a162-1680 v2773 a

The preparation and properties of Nb2O5 coatings made by the sol-gel process were investigated. The films were deposited by spin coating on In2O3:Sn/glass and quartz substrates from a polymeric solutions of niobia derived from niobium ethoxide. The films were characterized by investigation of the stoichiometry, refractive index, optical transmission, electrochemical behavior, and the microstructure. X-ray diffraction studies showed the films to be amorphous for heat treatments below 450 °C. X-ray photoelectron spectroscopy (XPS) measurement revealed the O:Nb atomic stoichiometry to be 5:2. Cyclic voltammetric measurements showed that the Nb2O5/1 M LiClO4-propylene carbonate system exhibits electrochemical reversibility beyond 1200 cycles without change in performance. In situ UV-Vis-NIR spectroelectrochemical measurement revealed that Nb2O5 films exhibit an electrochromic effect in the spectral range 300<λ<2100 nm and remain unchanged in the infrared spectral range. The change in visible transmittance was 40% for a 250 nm thick electrode. XPS spectra indicate that Nb(V) is reduced to a lower valence state Nb(IV) in a colored state with injected Li+. The bronze coloration is due to a simultaneous injection of electrons and Li+ ions into Nb2O5. The sol-gel-deposited Nb2O5 films are useful for cathodically coloring electrochromic electrodes in electrochromic devices.

10aElectrochemistry10aNiobium oxide10aoptical properties10aX-ray photoelectron spectroscopy1 aÖzer, Nilgün1 aChen, Din-Guo1 aLampert, Carl, M uhttp://dx.doi.org/10.1016/0040-6090(95)08011-2