01782nas a2200205 4500008003900000022001400039245008700053210006900140260001200209300001100221490000700232520110700239653003601346653001901382653004001401100002101441700001801462700001901480856007701499 2014 d a0963-025200aAsymmetric particle fluxes from drifting ionization zones in sputtering magnetrons0 aAsymmetric particle fluxes from drifting ionization zones in spu c04/2014 a0250070 v233 a
Electron and ion fluxes from direct current and high-power impulse magnetron sputtering (dcMS and HiPIMS) plasmas were measured in the plane of the target surface. Biased collector probes and a particle energy and mass analyzer showed asymmetric emission of electrons and of singly and doubly charged ions. For both HiPIMS and dcMS discharges, higher fluxes of all types of particles were observed in the direction of the electrons' E x B drift. These results are put in the context with ionization zones that drift over the magnetron's racetrack. The measured currents of time-resolving collector probes suggest that a large fraction of the ion flux originates from drifting ionization zones, while energy-resolving mass spectrometry indicates that a large fraction of the ion energy is due to acceleration by an electric field. This supports the recently proposed hypothesis that each ionization zone is associated with a negative–positive–negative space charge structure, thereby producing an electric field that accelerates ions from the location where they were formed.
10aInstrumentation and measurement10aPlasma physics10aSurfaces, interfaces and thin films1 aPanjan, Matjaž1 aFranz, Robert1 aAnders, André uhttps://facades.lbl.gov/publications/asymmetric-particle-fluxes-drifting01830nas a2200181 4500008003900000245010000039210006900139300001800208490000700226520121300233100002801446700002201474700001701496700001601513700002401529700001901553856007601572 2011 d00aAchieving high mobility ZnO:Al at very high growth rates by dc filtered cathodic arc deposition0 aAchieving high mobility ZnOAl at very high growth rates by dc fi a232003-2320070 v443 aAchieving a high growth rate is paramount for making large-area transparent conducting oxide coatings at a low cost. Unfortunately, the quality of thin films grown by most techniques degrades as the growth rate increases. Filtered dc cathodic arc is a lesser known technique which produces a stream of highly ionized plasma, in stark contrast to the neutral atoms produced by standard sputter sources. Ions bring a large amount of potential energy to the growing surface which is in the form of heat, not momentum. By minimizing the distance from cathode to substrate, the high ion flux gives a very high effective growth temperature near the film surface without causing damage from bombardment. The high surface temperature is a direct consequence of the high growth rate and allows for high-quality crystal growth. Using this technique, 500–1300 nm thick and highly transparent ZnO : Al films were grown on glass at rates exceeding 250 nm min−1 while maintaining resistivity below 5 × 10−4 Ω cm with electron mobility as high as 60 cm2 V−1 s−1.
1 aMendelsberg, Rueben, J.1 aLim, Sunnie, H.N.1 aZhu, Yuankun1 aWallig, Joe1 aMilliron, Delia, J.1 aAnders, André uhttps://facades.lbl.gov/publications/achieving-high-mobility-znoal-very