TY - JOUR T1 - The ‘recycling trap’: a generalized explanation of discharge runaway in high-power impulse magnetron sputtering JF - Journal of Physics D: Applied Physics Y1 - 2012/01// SP - 012003 A1 - André Anders A1 - Jiří Čapek A1 - Matêj Hála A1 - Ludvik Martinu AB - Contrary to paradigm, magnetron discharge runaway cannot always be related to self-sputtering. We report here that the high density discharge can be observed with all conducting targets, including low sputter yield materials such as carbon. Runaway to a high density discharge is therefore generally based on self-sputtering in conjunction with the recycling of gas atoms in the magnetic field-affected pre-sheath. A generalized runaway condition can be formulated, offering a pathway to a time-dependent model for high-power impulse magnetron sputtering that includes rarefaction and an explanation for the termination of runaway. VL - 45 IS - 1 JO - J. Phys. D: Appl. Phys. DO - 10.1088/0022-3727/45/1/012003 ER -