%0 Journal Article %J Journal of Physics D: Applied Physics %D 2012 %T The ‘recycling trap’: a generalized explanation of discharge runaway in high-power impulse magnetron sputtering %A André Anders %A Jiří Čapek %A Matêj Hála %A Ludvik Martinu %X

Contrary to paradigm, magnetron discharge runaway cannot always be related to self-sputtering. We report here that the high density discharge can be observed with all conducting targets, including low sputter yield materials such as carbon. Runaway to a high density discharge is therefore generally based on self-sputtering in conjunction with the recycling of gas atoms in the magnetic field-affected pre-sheath. A generalized runaway condition can be formulated, offering a pathway to a time-dependent model for high-power impulse magnetron sputtering that includes rarefaction and an explanation for the termination of runaway.

%B Journal of Physics D: Applied Physics %V 45 %P 012003 %8 01/2012 %N 1 %! J. Phys. D: Appl. Phys. %R 10.1088/0022-3727/45/1/012003