Publications
"Modeling of optical and energy performance of tungsten-oxide-based electrochromic windows including their intermediate states." Solar Energy Materials and Solar Cells 108 (2013) 129 - 135.
. "Observation of Self-Sputtering in Energetic Condensation of Metal Ions." Applied Physics Letters 85 (2004) 6137-6139. LBNL-55876.
. "Observation of Ti4+ ions in a high power impulse magnetron sputtering plasma." Applied Physics Letters 93.7 (2008) 71504. LBNL-680E.
. "Physical properties of erbium implanted tungsten oxide films deposited by reactive dual magnetron sputtering." Thin Solid Films 515.13 (2007) 5264-5269. LBNL-62248.
. "Physics of Arcing, and Implications to Sputter Deposition." International Conference on Coatings on Glass. Saarbrucken, Germany, 2003. LBNL-54220.
. "Physics of Arcing, and Implications to Sputter Deposition." Thin Solid Films (2005). LBNL-54220 .
. "Physics of High Power Impulse Magnetron Sputtering." ISSP2007: The 9th International Symposium on Sputtering & Plasma Processes. 2007. LBNL-62147.
. "Plasma and Ion Assistance in Physical Vapor Deposition: A Historical Perspective." 50th Technical Annual Meeting of the Society of Vacuum Coaters. 2007. LBNL-61903.
. "Plasma and Ion Sources in Large Area Coatings: A Review." 2005. LBNL-57127.
. "Plasma biasing to control the growth conditions of diamond-like carbon." Surface and Coatings Technology 201.8 (2006) 4628-4632. LBNL-59023.
. "A Plasma Lens for Magnetron Sputtering." IEEE Transactions on Plasma Science 39.11 (2011) 2528 - 2529.
. "Plasma-Based Ion Implantation and Deposition: A Review of Physics, Technology, and Applications." IEEE Transactions on Plasma Science 33 (2005) 1944-1959. LBNL-57610.
. "Pressure Controlled GaN MBE Growth Using a Hollow Anode Nitrogen Ion Source." . Materials Research Society Proceedings 449.221 (1997). LBNL-39851.
. "The ‘recycling trap’: a generalized explanation of discharge runaway in high-power impulse magnetron sputtering." Journal of Physics D: Applied Physics 45.1 (2012) 012003.
. "Self-sputtering far above the runaway threshold: an extraordinary metal ion generator." Physical Review Letters (2008). LBNL-1641E.
. "Self-sputtering runaway in high power impulse magnetron sputtering: The role of secondary electrons and multiply charged metal ions." Applied Physics Letters 92.20 (2008). LBNL-171E.
. "Smoothing of ultrathin silver films by transition metal seeding." Applied Physics Letters (2006). LBNL-59621.
. "Spatial distribution of average charge state and deposition rate in high power impulse magnetron sputtering of copper." Journal of Physics D 41 (2008) 135210-1-6. LBNL-679E.
. "Spectroscopic imaging of self-organization in high power impulse magnetron sputtering plasmas." Applied Physics Letters 103.5 (2013) 054104.
. "Structural, optical and electrical properties of WOxNy films deposited by reactive dual magnetron sputtering." Surface and Coatings Technology 201.6 (2006) 2977-2983. LBNL-59900.
. "The structure and electron energy loss near edge structure of tungsten oxide thin films prepared by pulsed cathodic arc deposition and plasma-assisted pulsed magnetron sputtering." Journal of Physics: Condensed Matter 20 (2008) 175216. LBNL-580E.
. "Supersonic metal plasma impact on a surface: an optical investigation of the pre-surface region." Journal of Physics D: Applied Physics 43.13 (2010). LBNL-2982E.
. "Surface Engineering of Glazing Materials and Structures Using Plasma Processes." Glass Processing Days 2003 . Tampere, Finland, 2003. LBNL-52436.
. "Time-Dependence of Ion Charge State Distributions of Vacuum Arcs: An Interpretation Involving Atoms and Charge Exchange Collisions." IEEE Transactions on Plasma Science 33 (2004) 205-209. LBNL-56214.
. "Working Principle of the Hollow-Anode Plasma Source." Plasma Source Science and Technology 4.4 (1995) 571-575. LBL-36240.
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