Publications

Publications describing the Windows and Envelope Materials Group’s building façade research can be searched through the Energy Technology Area’s publications webpage.

From the ETA’s publications page, under Organization, filter for the Windows and Envelope Materials Group.

Publications

Export 359 results:
[ Author(Asc)] Title Type Year
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A
Anders, André, Sunnie HN Lim, Kin Man Yu, Joakim Andersson, Johanna Rosén, Mike McFarland, and Jeff Brown. "High quality ZnO:Al transparent conducting oxide films synthesized by pulsed filtered cathodic arc deposition." Thin Solid Films (2009). LBNL-1881E.
Anders, André. "Plasma and Ion Assistance in Physical Vapor Deposition: A Historical Perspective." 50th Technical Annual Meeting of the Society of Vacuum Coaters. 2007. LBNL-61903.
Anders, André, Jiří Čapek, Matêj Hála, and Ludvik Martinu. "The ‘recycling trap’: a generalized explanation of discharge runaway in high-power impulse magnetron sputtering." Journal of Physics D: Applied Physics 45.1 (2012) 012003.
Anders, André. "Self-sputtering runaway in high power impulse magnetron sputtering: The role of secondary electrons and multiply charged metal ions." Applied Physics Letters 92.20 (2008). LBNL-171E.
Anders, André, and Georgy Yu Yushkov. "A low-energy linear oxygen plasma source." Review of Scientific Instruments 78.4 (2007). LBNL-62169.
Anders, André, Nitisak Pasaja, Sakon Sansongsiri, and Sunnie HN Lim. "Filtered cathodic arc deposition with ion-species-selective bias." Review of Scientific Instruments (2006). LBNL-61733.
Anders, André, Joakim Andersson, David Horwat, and Arutiun P Ehiasarian. "Physics of High Power Impulse Magnetron Sputtering." ISSP2007: The 9th International Symposium on Sputtering & Plasma Processes. 2007. LBNL-62147.
Anders, André, Nitisak Pasaja, Sunnie HN Lim, Tim C Petersen, and Vicki J Keast. "Plasma biasing to control the growth conditions of diamond-like carbon." Surface and Coatings Technology 201.8 (2006) 4628-4632. LBNL-59023.
Anders, André, and Jeff Brown. "A Plasma Lens for Magnetron Sputtering." IEEE Transactions on Plasma Science 39.11 (2011) 2528 - 2529.

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